N. Possémé: search on Z-Library

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1

Surface affinity role in graphoepitaxy of lamellar block copolymers

Claveau, Guillaume, Quemere, Patrick, Argoud, Maxime, Hazart, Jerome, Barros, Patricia Pimenta, Sarrazin, Aurelien, Posseme, Nicolas, Tiron, Raluca, Chevalier, Xavier, Nicolet, Celia, Navarro, Christo

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 6.38 MB

english, 2016

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advanced Etch Technology for Nanopatterning III - Plasma etching and integration challenges using alternative patterning techniques for 11nm node and beyond

Oehrlein, Gottlieb S., Lin, Qinghuang, Zhang, Ying, Barnola, S., Pimenta Barros, P., Arvet, C., Vizioz, C., Posseme, N., Gharbi, A., Argoud, M., Tiron, R., Pradelles, J., Desvoivres, L., Barraud, S.

Year:

2014

Language:

english

File:

PDF, 2.11 MB

english, 2014

3

[IEEE Proceedings of the IEEE 2006 International Interconnect Technology Conference - Burlingame, CA (2006.06.5-2006.06.7)] 2006 International Interconnect Technology Conference - New etch challenges for the 65-nm technology node Low-k integration using An enhanced Trench First Hard Mask architecture

Posseme, N., Maurice, C., Brun, Ph., Oilier, E., Guillermet, M., Verove, C., Berger, T., Fox, T., Hinsinger, O.

Year:

2006

Language:

english

File:

PDF, 255 KB

english, 2006

4

Patterning of narrow porous SiOCH trenches using a TiN hard mask

M. Darnon, T. Chevolleau, D. Eon, R. Bouyssou, B. Pelissier, L. Vallier, O. Joubert, N. Posseme, T. David, F. Bailly, J. Torres

Journal:

Microelectronic Engineering

Year:

2008

Language:

english

File:

PDF, 1008 KB

english, 2008

5

[IEEE 2010 IEEE International Interconnect Technology Conference - IITC - Burlingame, CA, USA (2010.06.6-2010.06.9)] 2010 IEEE International Interconnect Technology Conference - Etching process scalability and challenges for ULK materials

Chevolleau, T., Posseme, N., David, T., Bouyssou, R., Ducote, J., Bailly, F., Darnon, M., Kodadi, M. El, Besacier, M., Licitra, C., Guillermet, M., Ostrovsky, A., Verove, C., Joubert, O.

Year:

2010

Language:

english

File:

PDF, 1.63 MB

english, 2010

6

Aspartate is a limiting metabolite for cancer cell proliferation under hypoxia and in tumours

Garcia-Bermudez, Javier, Baudrier, Lou, La, Konnor, Zhu, Xiphias Ge, Fidelin, Justine, Sviderskiy, Vladislav O., Papagiannakopoulos, Thales, Molina, Henrik, Snuderl, Matija, Lewis, Caroline A., Possem

Journal:

Nature Cell Biology

Year:

2018

Language:

english

File:

PDF, 1.46 MB

english, 2018

7

Plasma Etching Processes for Interconnect Realization in VLSI || Interaction Plasma/Dielectric

Posseme, Nicolas

Year:

2015

Language:

english

File:

PDF, 2.63 MB

english, 2015

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advanced Etch Technology for Nanopatterning IV - DSA planarization approach to solve pattern density issue

Lin, Qinghuang, Engelmann, Sebastian U., Zhang, Ying, Pimenta Barros, P., Gharbi, A., Sarrazin, A., Tiron, R., Posseme, N., Barnola, S., Bos, S., Tallaron, C., Claveau, G., Chevalier, X., Argoud, M.,

Year:

2015

Language:

english

File:

PDF, 1.21 MB

english, 2015

9

Etching of porous SiOCH materials in fluorocarbon-based plasmas

N. Posseme, T. Chevolleau, O. Joubert, L. Vallier, N. Rochat

Year:

2004

Language:

english

File:

PDF, 838 KB

english, 2004

10

Analyses of chamber wall coatings during the patterning of ultralow-k materials with a metal hard mask: Consequences on cleaning strategies

T. Chevolleau, M. Darnon, T. David, N. Posseme, J. Torres, O. Joubert

Year:

2007

Language:

english

File:

PDF, 1.02 MB

english, 2007

11

Goniotelemetry system

Posseme, Gilles

Journal:

The Journal of the Acoustical Society of America

Year:

1987

Language:

english

File:

PDF, 115 KB

english, 1987

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - Surface affinity role in directed self-assembly of lamellar block copolymers

Hohle, Christoph K., Younkin, Todd R., Claveau, G., Quemere, P., Argoud, M., Hazart, J., Pimenta Barros, P., Sarrazin, A., Posseme, N., Tiron, R., Chevalier, X., Nicolet, C., Navarro, C.

Year:

2016

Language:

english

File:

PDF, 2.32 MB

english, 2016

13

Identification de nouveaux marqueurs moléculaires à valeur pronostique des adénocarcinomes à cellules claires du rein

Cros, J., Letierce, A., Posseme, K., Benoit, G., Guettier, C., Ferlicot, S.

Journal:

Annales de Pathologie

Year:

2011

Language:

french

File:

PDF, 43 KB

french, 2011

14

[IEEE 2011 Materials for Advanced Metallization (MAM) - Dresden, Germany (2011.05.8-2011.05.12)] 2011 IEEE International Interconnect Technology Conference - Impact of ambient atmosphere on plasma-damaged porous low-k characterization

Darnon, M., Chevolleau, T., David, T., Posseme, N., Bouyssou, R., Hurand, R., Joubert, O., Licitra, C., Rochat, N., Bailly, F., Verove, C.

Year:

2011

Language:

english

File:

PDF, 241 KB

english, 2011

15

[IEEE Proceedings of the IEEE 2006 International Interconnect Technology Conference - Burlingame, CA (2006.06.5-2006.06.7)] 2006 International Interconnect Technology Conference - Effect of CH4 plasma on porous dielectric modification & pore sealing for advanced interconnect technology nodes

Aimadeddine, M., Arnal, V., Roy, R., Farcy, A., David, T., Chevolleau, T., Posseme, N., Vitiello, J., Chapelon, L.L., Guedj, C., Brechet, Y., Volpi, F., Torres, J.

Year:

2006

Language:

english

File:

PDF, 671 KB

english, 2006

16

Isotropic dry etching of Si selectively to Si 0.7 Ge 0.3 for CMOS sub-10ânm applications

Rachidi, Sana, Campo, Alain, Loup, Virginie, Vizioz, Christian, Hartmann, Jean-Michel, Barnola, SÃ©bastien, Posseme, Nicolas

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2020

Language:

english

File:

PDF, 4.23 MB

english, 2020

17

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advanced Etch Technology for Nanopatterning V - PMMA removal selectivity to PS using dry etch approach: sub-10nm patterning application

Lin, Qinghuang, Engelmann, Sebastian U., Sarrazin, A., Posseme, N., Pimenta-Barros, P., Barnola, S., Claveau, G., Gharbi, A., Argoud, M., Chamiot-Maitral, G., Tiron, R., Nicolet, C., Navarro, C., Card

Year:

2016

Language:

english

File:

PDF, 1.35 MB

english, 2016

18

[IEEE 2010 IEEE International Electron Devices Meeting (IEDM) - San Francisco, CA, USA (2010.12.6-2010.12.8)] 2010 International Electron Devices Meeting - Planar Fully depleted SOI technology: A powerful architecture for the 20nm node and beyond

Faynot, O., Andrieu, F., Weber, O., Fenouillet-Beranger, C., Perreau, P., Mazurier, J., Benoist, T., Rozeau, O., Poiroux, T., Vinet, M., Grenouillet, L., Noel, J-P., Posseme, N., Barnola, S., Martin,

Year:

2010

Language:

english

File:

PDF, 655 KB

english, 2010

19

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advanced Etch Technology for Nanopatterning - Towards new plasma technologies for 22nm gate etch processes and beyond

Joubert, O., Darnon, M., Cunge, G., Pargon, E., Thibault, D., Petit-Etienne, C., Vallier, L., Posseme, N., Bodart, P., Azarnouche, L., Blanc, R., Haas, M., Brihoum, M., Banna, S., Lill, T., Zhang, Yin

Year:

2012

Language:

english

File:

PDF, 392 KB

english, 2012

20

Impact of patterning and ashing on electrical properties and reliability of interconnects in a porous SiOCH ultra low-k dielectric material

M. Aimadeddine, V. Arnal, A. Farcy, C. Guedj, T. Chevolleau, N. Possémé, T. David, M. Assous, O. Louveau, F. Volpi, J. Torres

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 339 KB

english, 2005

21

Thin layer etching of low-k SiCO spacer using hydrogen ion implantation followed by hydrofluoric acid

Posseme, Nicolas, Garcia-Barros, Maxime, Leverd, François, Benoit, Daniel, Pollet, Olivier, Audoit, Guillaume, Guedj, Cyril, Jannaud, Audrey, Barnola, S.

Journal:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Year:

2018

Language:

english

File:

PDF, 1.82 MB

english, 2018

22

Mechanisms of porous dielectric film modification induced by reducing and oxidizing ash plasmas

N. Posseme, T. Chevolleau, T. David, M. Darnon, O. Louveau, O. Joubert

Year:

2007

Language:

english

File:

PDF, 1.12 MB

english, 2007

23

Patterning of porous SiOCH using an organic mask: Comparison with a metallic masking strategy

Darnon, M., Chevolleau, T., David, T., Ducote, J., Posseme, N., Bouyssou, R., Bailly, F., Perret, D., Joubert, O.

Journal:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Year:

2010

Language:

english

File:

PDF, 993 KB

english, 2010

24

Characterization of photoresist films exposed to high-dose implantation conditions

Croisy, Marion, Pargon, Erwine, Jenny, Cécile, Richard, Claire, Guiheux, Denis, Mariolle, Denis, Poulain, Christophe, Campo, Alain, Possémé, Nicolas

Journal:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Year:

2018

Language:

english

File:

PDF, 6.94 MB

english, 2018

25

Modifications of dielectric films induced by plasma ashing processes: Hybrid versus porous SiOCH materials

M. Darnon, T. Chevolleau, T. David, N. Posseme, J. Ducote, C. Licitra, L. Vallier, O. Joubert, J. Torres

Year:

2008

Language:

english

File:

PDF, 1.10 MB

english, 2008

26

Plasma Etching Processes for Interconnect Realization in VLSI || Introduction

Posseme, Nicolas

Year:

2015

File:

PDF, 1.13 MB

2015

27

Roughening of porous SiCOH materials in fluorocarbon plasmas

Bailly, F., David, T., Chevolleau, T., Darnon, M., Posseme, N., Bouyssou, R., Ducote, J., Joubert, O., Cardinaud, C.

Journal:

Journal of Applied Physics

Year:

2010

Language:

english

File:

PDF, 2.02 MB

english, 2010

28

L'invention politique de l'environnement || Archives africaines des partis politiques et syndicats français

Gwénola Possémé-Rageau

Journal:

Vingtième Siècle Revue d histoire

Year:

2012

Language:

french

File:

PDF, 334 KB

french, 2012

29

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advanced Etch Technology for Nanopatterning VI - Nanoimprint, DSA, and multi-beam lithography: patterning technologies with new integration challenges

Engelmann, Sebastian U., Wise, Rich S., Landis, S., Teyssedre, H., Claveau, G., Servin, I., Delachat, F., Pourteau, M. L., Gharbi, A., Pimenta Barros, P., Tiron, R., Nouri, L., Possemé, N., May, M., B

Year:

2017

Language:

english

File:

PDF, 1.05 MB

english, 2017

30

Plasma Etching Processes for Interconnect Realization in VLSI || Porous SiOCH Film Integration

Posseme, Nicolas

Year:

2015

Language:

english

File:

PDF, 6.82 MB

english, 2015

31

Characterization and Development of High Dose Implanted Resist Stripping Processes

Croisy, Marion, Jenny, Cécile, Richard, Claire, Guiheux, Denis, Campo, Alain, Pargon, Erwine, Possémé, Nicolas

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 4.13 MB

english, 2016

32

[IEEE 2015 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2015.3.15-2015.3.16)] 2015 China Semiconductor Technology International Conference - Etching and stripping process developments for sub-10nm FDSOI device architectures using alternative lithography techniques

Pollet, O., Barnola, S., Posseme, N., Pimenta-Barros, P.

Year:

2015

Language:

english

File:

PDF, 836 KB

english, 2015

33

Four-Year Experience of Digital Slide Telepathology for Intraoperative Frozen Section Consultations in a Two-Site French Academic Department of Pathology

Laurent-Bellue, Astrid, Poullier, Eric, Pomerol, Jean-FranÃ§ois, Adnet, Eric, Redon, Marie-JosÃ©, Posseme, Katia, Trassard, Olivier, Cherqui, Daniel, Zarca, Kevin, Guettier, Catherine

Journal:

American Journal of Clinical Pathology

Year:

2020

File:

PDF, 523 KB

2020

34

( E )-α-Substituted γ-Alkoxyallylboronic Esters as New Reagents: Synthesis and Reactivity toward Aldehydes

Possémé,, Françoise, Deligny, Michael, Carreaux, François, Carboni, Bertrand

Journal:

Journal of Organic Chemistry

Year:

2007

Language:

english

File:

PDF, 117 KB

english, 2007

35

Silicon Anodization As a New Way to Transfer 3D Nano-Imprinted Pattern into a Substrate

Nouri, Lamia, Posseme, Nicolas, Landis, Stéfan, Milesi, Frederic, Gaillard, Frédéric, Mariolle, Denis, Licitra, Christophe

Journal:

ECS Transactions

Year:

2017

Language:

english

File:

PDF, 856 KB

english, 2017

36

[IEEE 2011 IEEE International SOI Conference - Tempe, AZ, USA (2011.10.3-2011.10.6)] IEEE 2011 International SOI Conference - Implant approaches and challenges for 20nm node and beyond ETSOI devices

Ponoth, S., Vinet, M., Grenouillet, L., Kumar, A., Kulkarni, P., Liu, Q., Cheng, K., Haran, B., Posseme, N., Khakifirooz, A., Loubet, N., Mehta, S., Kuss, J., Destefanis, V., Berliner, N., Sreenivasan

Year:

2011

Language:

english

File:

PDF, 538 KB

english, 2011

37

Study of Resist Strip Chemistries for Ultra Low-k/Cu Interconnect

Xu, Han, David, Thibaut, Xu, Yin, Tarasov, Vlad, Possémé, Nicolas, Louis, Didier

Journal:

Solid State Phenomena

Year:

2008

Language:

english

File:

PDF, 2.10 MB

english, 2008

38

Etching mechanisms of low-k SiOCH and selectivity to SiCH and SiO[sub 2] in fluorocarbon based plasmas

N. Posseme, T. Chevolleau, O. Joubert, L. Vallier, P. Mangiagalli

Year:

2003

Language:

english

File:

PDF, 630 KB

english, 2003

39

Thin layer etching of silicon nitride: A comprehensive study of selective removal using NH 3 /NF 3 remote plasma

Posseme, N., Ah-Leung, V., Pollet, O., Arvet, C., Garcia-Barros, M.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2016

Language:

english

File:

PDF, 3.01 MB

english, 2016

40

Tumeurs de vessie chez les transplantés rénaux : vers un rôle oncogène du BK virus

Dao, M., Reimbold, P., François, H., Mussini, C., Guettier, C., Durrbach, A., Posseme, K., Bessede, T., Ferlicot, S.

Journal:

Néphrologie & Thérapeutique

Year:

2018

Language:

french

File:

PDF, 162 KB

french, 2018

41

Impact of Downstream Ash Plasmas on Ultra Low-k Materials

Possémé, Nicolas, David, Thibaut, Meininger, P., Louveau, O., Chevolleau, T., Joubert, O., Louis, Didier

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 620 KB

english, 2005

42

Political Theory, History of Political Thought, and Methodology

Xu, Han, David, Thibaut, Xu, Yin, Tarasov, Vlad, Possémé, Nicolas, Louis, Didier

Journal:

American Political Science Review

Year:

1964

Language:

english

File:

PDF, 513 KB

english, 1964

43

[IEEE 2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM) - Grenoble, France (2015.5.18-2015.5.21)] 2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM) - Plasma etch challenges at 14nm and beyond technology nodes in the BEOL

Brun, Ph., Bailly, F., Guillermet, M., Aparico, E., Posseme, N.

Year:

2015

Language:

english

File:

PDF, 454 KB

english, 2015

44

Usefulness of morphometric image analysis with Sirius Red to assess interstitial fibrosis after renal transplantation from uncontrolled circulatory death donors

Dao, Myriam, Pouliquen, Christelle, Duquesne, Alyette, Posseme, Katia, Mussini, Charlotte, Durrbach, Antoine, Guettier, Catherine, FranÃ§ois, HÃ©lÃ¨ne, Ferlicot, Sophie

Journal:

Scientific Reports

Year:

2020

File:

PDF, 3.14 MB

2020

45

(Z)-1,4-Diamino-2-butene as a vector of boron, fluorine, or iodine for cancer therapy and imaging: synthesis and biological evaluation

Bénédicte Martin, Françoise Possémé, Caroline Le Barbier, François Carreaux, Bertrand Carboni, Nikolaus Seiler, Jacques-Philippe Moulinoux, Jean-Guy Delcros

Journal:

Bioorganic & Medicinal Chemistry

Year:

2002

Language:

english

File:

PDF, 185 KB

english, 2002

46

Alternative process for thin layer etching: Application to nitride spacer etching stopping on silicon germanium

Posseme, N., Pollet, O., Barnola, S.

Journal:

Applied Physics Letters

Year:

2014

Language:

english

File:

PDF, 915 KB

english, 2014

47

Books on histology

Cros, J., Letierce, A., Posseme, K., Benoit, G., Guettier, C., Ferlicot, S.

Journal:

International Journal of Orthodontia

Year:

1917

Language:

english

File:

PDF, 82 KB

english, 1917

48

Impact of low-k structure and porosity on etch processes

Darnon, Maxime, Casiez, Nicolas, Chevolleau, Thierry, Dubois, Geraud, Volksen, Willi, Frot, Théo J., Hurand, Romain, David, Thibaut L., Posseme, Nicolas, Rochat, Névine, Licitra, Christophe

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2013

Language:

english

File:

PDF, 3.89 MB

english, 2013

49

Measuring the diffusion of Ti and Cu in low-k materials for microelectronic devices by EELS, EFTEM and EDX

Barnes, J-P, Lafond, D, Guedj, C, Fayolle, M, Meininger, P, Maitrejean, S, David, T, Possémé, N, Bayle-Guillemaud, P, Chabli, Amal

Journal:

Journal of Physics Conference Series

Year:

2006

Language:

english

File:

PDF, 965 KB

english, 2006

50

Distinctive roles of age, sex, and genetics in shaping transcriptional variation of human immune responses to microbial challenges

Piasecka, Barbara, Duffy, Darragh, Urrutia, Alejandra, Quach, Hélène, Patin, Etienne, Posseme, Céline, Bergstedt, Jacob, Charbit, Bruno, Rouilly, Vincent, MacPherson, Cameron R., Hasan, Milena, Albaud

Journal:

Proceedings of the National Academy of Sciences

Year:

2017

Language:

english

File:

PDF, 8.02 MB

english, 2017

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